SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
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United States of America Patent
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May 2, 2024
app pub date -
Jan 10, 2024
filing date -
Aug 6, 2021
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Abstract
Example implementations described herein include a laser source and associated methods of operation that can balance or reduce uneven beam profile problem and even improve plasma heating efficiency to enhance conversion efficiency and intensity for extreme ultraviolet radiation generation. The laser source described herein generates an auxiliary laser beam to augment a pre-pulse laser beam and/or a main-pulse laser beam, such that uneven beam profiles may be corrected and/or compensated. This may improve an intensity of the laser source and also improve an energy distribution from the laser source to a droplet of a target material, effective to increase an overall operating efficiency of the laser source.
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