CHEMICAL SOLUTION FOR REMOVING PRECIOUS METAL, METHOD FOR MANUFACTURING CHEMICAL SOLUTION, METHOD FOR TREATING SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
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United States of America Patent
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Issued Date -
Jun 13, 2024
app pub date -
Dec 4, 2023
filing date -
Dec 9, 2022
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Abstract
A chemical solution for removing a precious metal includes a cerium-containing oxidizing agent (A), a metal component (B) including a transition metal other than cerium, and water, in which a content of the metal component (B) is less than 1.65×10−3 parts by mass with respect to 1 part by mass of the cerium-containing oxidizing agent (A) in terms of the transition metal.
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