PLASMA TREATMENT APPARATUS

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United States of America Patent

APP PUB NO 20240207473A1
SERIAL NO

17928800

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Abstract

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Provided is a plasma treatment apparatus that does not use a separate process gas by discharging low-pressure atmosphere formed in a sealed space in which a plasma surface treatment is performed. Therefore, by discharging the low-pressure atmosphere using a relatively low voltage, stable plasma with high surface treatment efficiency may be generated, and thus a plasma treatment apparatus may be configured economically and no operation and management costs due to the use of a process gas are incurred. Also, the safety and the effectiveness of a plasma surface treatment process to be applied in the medical industry are secured, and sterility may be secured and usability may be maximized.

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Patent Owner(s)

Patent OwnerAddress
PLASMAPP CO LTD#111 125 GWAHAK-RO YUSEONG-GU DAEJEON 34141 34141

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
LIM, You Bong Daejeon, KR 4 0

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