METHOD AND APPARATUS FOR DETERMINING OPTICAL PROPERTIES OF DEPOSITION MATERIALS USED FOR LITHOGRAPHIC MASKS
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United States of America Patent
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Issued Date -
Jul 4, 2024
app pub date -
Jan 30, 2024
filing date -
Jul 30, 2021
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Abstract
The present invention refers to a method for determining at least one optical property of at least one deposition material used for a lithographic mask which comprises the steps: (a) determining a height value of the at least one deposition material deposited on a substrate for each of at least three different deposition heights of the deposition material, wherein the at least three different deposition heights are in a nanoscale range; (b) determining a reflectivity value of the at least one deposition material for each of the at least three different deposition heights, wherein determining the reflectivity values comprises using photons generated by an optical inspection system; and (c) determining the at least one optical property of the at least one deposition material by adapting simulated reflectivity data to the measured reflectivity values for each of the at least three different deposition heights.
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