METHODS FOR MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY
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United States of America Patent
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Jul 4, 2024
app pub date -
Mar 15, 2024
filing date -
Dec 22, 2017
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Abstract
Methods for reticle enhancement technology include inputting a target wafer pattern, the target wafer pattern spanning an entire design area, and iterating a proposed mask for the entire design area until the proposed mask meets criteria towards producing the target wafer pattern. Each iteration includes calculating a predicted wafer pattern from the proposed mask. The calculating comprises calculating a cost and derivative data, the cost and the derivative data being based on comparing the predicted wafer pattern to the target wafer pattern. The cost further comprises specifications for mask manufacturability.
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