DISCHARGING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
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United States of America
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Issued Date -
Apr 25, 2024
app pub date -
Sep 12, 2023
filing date -
Sep 12, 2023
priority date (Note) -
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Abstract
According to at least one example embodiment, a substrate treating apparatus includes a substrate support structure including a spin head, the substrate support structure configured to support a substrate, and rotate the substrate, at least one treating liquid recovery container configured to recover at least one substrate treating liquid, and a discharging device including a first nozzle and a second nozzle, the first nozzle configured to discharge a chemical onto the substrate, and the second nozzle configured to discharge deionized water onto the substrate, wherein the first nozzle includes a surface pattern configured to provide roughness on an inner surface of the first nozzle.
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