Mask Jig, Film Formation Method, and Film Formation Apparatus
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United States of America Patent
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Issued Date -
Jul 18, 2024
app pub date -
Mar 30, 2022
filing date -
May 31, 2021
priority date (Note) -
Published
status (Latency Note)
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Abstract
A mask jig, by which a film having stable quality can be efficiently formed on a surface of a substrate, includes a main body portion and a mask cover. The main body portion includes a first surface and a second surface located opposite to the first surface. The mask cover is disposed on the second surface side of the main body portion so as to overlap with the main body portion, and includes a third surface and a fourth surface located opposite to the third surface. The mask cover is composed of an imide-based resin.
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