ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS

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United States of America Patent

APP PUB NO 20240247370A1
SERIAL NO

18099459

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A method includes depositing a coating including stoichiometric one-to-one ruthenium oxide (RuO) onto a surface of a substrate. The coating is deposited by performing an atomic layer deposition (ALD) process using at least one precursor.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Anthis, Jeffrey W Redwood City, US 89 4744
Enman, Lisa Sunnyvale, US 2 0
Kalutarage, Lakmal Charidu San Jose, US 20 14
Kazem, Nasrin Santa Clara, US 13 4
Knisley, Thomas Joseph Livonia, US 26 1609
Potter, Jayden Stephen John Shackerley Menlo Park, US 1 0

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