Methods and Systems for Improved Manufacturing of Off-The-Rack, Tailored and/or Customized Clothing
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United States of America Patent
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Issued Date -
Aug 1, 2024
app pub date -
Apr 10, 2024
filing date -
Aug 24, 2020
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Abstract
Methods and systems for the improved manufacturing of off-the-rack, tailored and/or customized clothing include a dual-sizing chart, dual-sizing pattern making process, dual-sized pattern, dual-sizing garments, manufacturing interface, dual-sizing ordering and marketing process, dual-sizing ordering interface, dual-sizing conversion process, dual-sized garment (for example a dress, pant suit, shapewear or one-piece swimsuit, romper, or jumper), and a dual-sizing manufacturing process.
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