WET ETCH FORMULATIONS AND RELATED METHODS
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United States of America Patent
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Issued Date -
Aug 1, 2024
app pub date -
Feb 1, 2024
filing date -
Feb 1, 2023
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Abstract
Wet etch compositions and related methods are provided herein. A wet etch composition for molybdenum, may include phosphoric acid, acetic acid, nitric acid, and an additive for reducing an oxidation rate of a MoOx layer. The additive may be present in an amount of 0.01% to 5% by weight based on a total weight of the wet etch composition.
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