SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

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United States of America Patent

APP PUB NO 20240290577A1
SERIAL NO

18660479

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Abstract

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A substrate processing apparatus comprises a power storage part and at least one unit or member that uses a power. Charges stored in the power storage part are supplied, as a power, to the unit or the member.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO 107-6325

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ENDO, Hiroki Miyagi, JP 104 724
FUJIWARA, Naoki Miyagi, JP 189 1698
ISHIKAWA, Shinya Miyagi, JP 95 205
MATSUMOTO, Naoki Miyagi, JP 303 9159
MIHARA, Naoki Miyagi, JP 20 1188
NAGAMI, Koichi Miyagi, JP 50 910
NAGASHIMA, Nozomu Miyagi, JP 15 117
TAMONOKI, Shinya Miyagi, JP 12 24

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