GAS CONTROL APPARATUS FOR GAS DISCHARGE STAGE

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United States of America Patent

APP PUB NO 20240291226A1
SERIAL NO

18571826

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A gas control apparatus includes a control system in communication with a gas discharge chamber. The control system includes a performance monitoring module configured to, during standard mode of operation of the gas discharge chamber and in between performance of gas recovery schemes on the gas discharge chamber that use a gas recovery setting: compare one or more performance parameters of the gas discharge chamber to respective thresholds; determine whether the gas recovery setting needs to be adjusted based on the comparison; and adjust the value for the gas recovery setting based on the determination. The control system includes a gas recovery module configured to perform the gas recovery scheme, the gas recovery module being configured to access the most recently adjusted value for the gas recovery setting from the performance monitoring module when performing the current gas recovery scheme.

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Patent Owner(s)

Patent OwnerAddress
CYMER LLC17075 THORNMINT COURT SAN DIEGO CA 92127

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Siyu San Diego, US 20 68
Williams, Spencer Ryan San Diego, US 3 0

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