WAFER CLEANING BRUSH, WAFER CLEANING DEVICE INCLUDING THE SAME, AND WAFER CLEANING METHOD USING THE SAME
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United States of America Patent
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Issued Date -
Sep 12, 2024
app pub date -
Aug 22, 2023
filing date -
Mar 6, 2023
priority date (Note) -
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Abstract
A wafer cleaning brush includes a rotatable core, a brush body surrounding an outer circumferential surface of the core, and a plurality of protrusions disposed on a brush body surface, where a pitch of the plurality of protrusions in a length direction of the brush body may be in a range of 11 mm to 15 mm, and where, for each of the plurality of protrusions, a value obtained by dividing a long side of the brush body in the length direction by the pitch is below 0.55.
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