HYDROGEN PEROXIDE PLASMA SURFACE MODIFICATION
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United States of America Patent
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Issued Date -
Sep 12, 2024
app pub date -
Feb 26, 2024
filing date -
Mar 6, 2023
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Abstract
The techniques described herein relate to hydrogen peroxide plasma surface modification. In some embodiments, a method includes providing a mixture including hydrogen peroxide vapor from a source, wherein a concentration of the hydrogen peroxide vapor in the mixture is substantially stable over time. The method further includes forming a hydrogen peroxide plasma from the mixture and exposing a material to the hydrogen peroxide plasma in a chamber.
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