WAFER STORAGE CONTAINER DRYING APPARATUS AND CLEANING SYSTEM

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20240302099A1
SERIAL NO

18583578

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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According to one embodiment of the present disclosure, a wafer storage container drying apparatus includes a drying tank for drying a wafer storage container that has a storage space connected to an opening and configured to store a wafer, and includes a body including a flange gripped by a robot, and a door installed to be openable and closable with respect to the opening, wherein the drying tank includes a carrying-in/out port configured to be openable and closable by an opening and closing cover, a body receiver configured to receive the body of the wafer storage container in a state where the flange faces the carrying-in/out port; and a door holder configured to hold the door such that each side of the door is neither orthogonal nor parallel to one side that forms the carrying-in/out port, when the drying tank is viewed in a plan view.

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First Claim

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Patent Owner(s)

Patent OwnerAddress
SHIBAURA MECHATRONICS CORPORATION5-1 KASAMA 2-CHOME SAKAE-KU YOKOHAMA-SHI KANAGAWA 247-8610

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ISHIHARA, Junji Kanagawa, JP 11 61
MIYASAKO, Hisaaki Kanagawa, JP 7 8
NISHIBE, Yukinobu Kanagawa, JP 14 43

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