Automatic Generation of Pattern from Measured Parameters

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20240315371A1
SERIAL NO

18732616

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Embodiments relate to generating a pattern of a garment involves receiving measurement parameters of a garment. Upon receiving measurement parameters, points that are connected to form an outline of the pattern are generated based on the measurement parameters and pattern information. These points may be assigned to different types depending on which part of the pattern they belong. Locations of points of references are determined to generate the pattern in accordance with the measurement parameters. The points are connected by a straight line or a curved line to define the pattern.

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Patent Owner(s)

Patent OwnerAddress
CLO VIRTUAL FASHION INC43F 42F 152 TEHERAN-RO GANGNAM-GU SEOUL 06236 06236

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ahn, Hong Hyun Seoul, KR 1 0
Gatta, Phoebe New York, US 2 0

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