BLANK MASK AND PHOTOMASK USING THE SAME
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United States of America Patent
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Issued Date -
Oct 17, 2024
app pub date -
Jun 21, 2024
filing date -
Jun 21, 2024
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Abstract
A blank mask including a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film disposed on the phase shift film. The phase shift film has XRD maximum peak at 20 of 15° to 30° when normal mode XRD analysis is performed on an upper surface of the phase shift film. The transparent substrate has XRD maximum peak at 20 of 15° to 30° when performing normal mode XRD analysis on a lower surface of the transparent substrate. AI1 value of the blank mask expressed by below Equation is 0.9 to 1.1.
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