METAL ALKOXIDE COMPOUND, THIN FILM FORMING RAW MATERIAL, AND THIN FILM PRODUCTION METHOD

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Oct 24, 2024
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Jun 28, 2024
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Jun 28, 2024

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Abstract

The present invention provides a metal alkoxide compound represented by the following general formula (1), a thin-film-forming raw material containing the same, and a thin film production method of forming a metal-containing thin film using the raw material:

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ADEKA CORPORATION	ARAKAWA-KU TOKYO 116-8554

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Inventor Name	Address	# of filed Patents	Total Citations
HATASE, Masako	Tokyo, JP	25	15
NISHIDA, Akihiro	Tokyo, JP	58	349
OKADA, Nana	Tokyo, JP	10	1
SAKURAI, Atsushi	Tokyo, JP	209	1709

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METAL ALKOXIDE COMPOUND, THIN FILM FORMING RAW MATERIAL, AND THIN FILM PRODUCTION METHOD

Number of patents in Portfolio can not be more than 2000

United States of America Patent

18757905

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