BORATE-FREE, AQUEOUS COMPOSITION FOR CLEANING AND TREATING METALLIC SUBSTRATES

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United States of America Patent

APP PUB NO 20240352379A1
SERIAL NO

18686100

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Disclosed herein is a borate-free, aqueous cleaning and treating composition including at least one metasilicate (A); at least one orthophosphate (B); at least one phosphate (C); at least one surfactant (D); and where the aqueous cleaning and treating composition has a pH value at 20° C. in a range from 11.0 to 12.8; and possesses a molar ratio of Si atoms to P atoms being from 0.75:1 to 1:0.75, based on the sum of the Si-containing metasilicates (A) and the sum of the P-containing orthophosphates (B), diphosphates (C) and triphosphates (C). Further disclosed herein are solid mixtures. Additionally disclosed herein are a method for cleaning and treating metallic substrates by using the compositions and a method of using the compositions to clean metallic substrates and treat metallic substrates by forming a Si-containing layer on the surface of the metallic substrates.

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Patent Owner(s)

Patent OwnerAddress
CHEMETALL GMBHGERMANY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KOMP, Carola Frankfurt, DE 7 17
ROESNER, Berit Frankfurt, DE 1 0

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