STRAIN-LOCKING KNIT BAND STRUCTURES WITH EMBEDDED ELECTRONICS FOR WEARABLE DEVICES
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United States of America
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Issued Date -
Oct 31, 2024
app pub date -
Feb 15, 2024
filing date -
Feb 15, 2024
priority date (Note) -
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status (Latency Note)
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Abstract
An example softgood includes a fabric constructed using a knit pattern, and the fabric being configured to elongate along an axis. The fabric is configured to give up its mechanical slack that exists as a result of the knit pattern, whereby giving up the mechanical slack causes the fabric to be extended up to a length along the axis. The fabric is also configured to resist stretching to a longer length after the fabric has been extended up to the length along the first axis. The resistance to stretching is provided by fibers of the fabric, and a tension force required to overcome the resistance to stretching the fabric is greater than a force required to cause the fabric to give up its mechanical slack. The example softgood also includes an embedded conductive trace configured to have a maximum operating length that is at least equal to the length.
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