MASK BLANK AND PHASE SHIFT MASK
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United States of America
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Issued Date -
Oct 31, 2024
app pub date -
Mar 31, 2022
filing date -
Mar 31, 2022
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Abstract
Provided is a mask blank comprising a phase shift film A mask blank comprises a phase shift film on a transparent substrate. The phase shift film is made of a material comprising a transition metal, silicon, and nitrogen. A ratio of the total content of nitrogen and oxygen to the content of the transition metal is 12 or more and 19 or less in an internal region, wherein the internal region excludes a neighboring region of the phase shift film at an interface with the transparent substrate and a surface layer region of the phase shift film which is located opposite the transparent substrate.
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