PLATEN ROTATION DEVICE

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20240367286A1
SERIAL NO

18771782

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method includes controlling a rotational kinetic energy of a rotor assembly of a wafer-platen, wherein a rotational velocity of the wafer-platen is either increased or decreased. The method further includes generating an electrical energy output of the wafer-platen based on decreased rotational kinetic energy of the wafer-platen. The method further includes storing the electrical energy output by the rotator assembly based on the decreased rotational kinetic energy of the wafer-platen.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDHSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHO, Bruce Hsinchu, TW 4 4
KO, Huang-Chu Hsinchu, TW 9 18
TIEN, Chia-Ying Hsinchu, TW 8 14

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