DEPOSITION SYSTEM AND METHOD
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United States of America
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Issued Date -
Nov 28, 2024
app pub date -
Jul 30, 2024
filing date -
Jul 30, 2024
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Abstract
A deposition system is provided capable of cleaning itself by removing a target material deposited on a surface of a collimator. The deposition system in accordance with the present disclosure includes a substrate process chamber. The deposition includes a substrate pedestal in the substrate process chamber, the substrate pedestal configured to support a substrate, a target enclosing the substrate process chamber, and a collimator having a plurality of hollow structures disposed between the target and the substrate, a vibration generating unit, and cleaning gas outlet.
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