QUANTUM META-DEVICE FOR ULTRASENSITIVE DISPLACEMENT METROLOGY
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United States of America
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Dec 5, 2024
app pub date -
Oct 20, 2023
filing date -
Oct 20, 2023
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Abstract
Displacement measurement systems, measurement methods and EUV lithography machines for quantum meta-structure elements are disclosed, which include: an entangled state light source generator, a meta-device, a collimating lens, a polarizing beam splitter, and a computing section. Left-rotation photon and the right-rotation photon are projected to the polarizing beam splitter, and the correlation between output ports of two polarizing beam splitters is counted for reading to measure the displacement of the meta-device element. The displacement of the meta-structure element is measured in a manner that realizes the correlation between the left-rotation photons and the right-rotation photons.
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