SUBSTRATE DRYING DEVICE AND METHOD OF DRYING SUBSTRATE USING THE SAME
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United States of America
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Dec 12, 2024
app pub date -
Aug 21, 2024
filing date -
Aug 21, 2024
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Abstract
A substrate drying device includes: an upper chamber body including an inlet configured to introduce supercritical fluid into a chamber space; a lower chamber body including an outlet configured to discharge the supercritical fluid out of the chamber space; and a plurality of vibration devices including a plurality of vibration modules configured to generate ultrasonic waves having different frequencies from each other, and substrate holders arranged on the plurality of vibration modules and configured to hold a wafer, wherein the plurality of vibration devices are arranged in the chamber space.
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