FAR-INFRARED TRANSMITTING MEMBER AND METHOD OF MANUFACTURING FAR-INFRARED TRANSMITTING MEMBER
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United States of America
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Issued Date -
Dec 26, 2024
app pub date -
Sep 4, 2024
filing date -
Sep 4, 2024
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Abstract
To appropriately transmit a far infrared ray and improve scratch resistance. A far-infrared transmitting member 20 includes a substrate 30 that transmits a far infrared ray and a first functional film 32 that is formed on the substrate 30 and includes a NiOx layer 34 containing NiOx as a main component, an average transmittance of light having a wavelength of 8 μm to 12 μm is 50% or more, and a maximum value Hmax of indentation hardness in a range of an indentation depth of 40 nm or more and 110 nm or less from the surface of the functional film measured by a nanoindentation method is 10 GPa or more.
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