Importance

Loading Importance Indicators...

Abstract

Systems, apparatus, articles of manufacture, and methods to photolithographically pattern materials in integrated circuit packages are disclosed. An example photolithography mask includes: a transparent substrate, and an opaque material supported by the transparent substrate. The opaque material covers a first area of the transparent substrate. The example photolithography mask further includes an optical filter supported by the transparent substrate. The optical filter covers a second area of the transparent substrate. The second area is distinct from the first area. Both the opaque material and the optical material are spaced apart from a third area of the transparent substrate

Loading the Abstract Image...

First Claim