STABLE SOLUTIONS OF MONOALKYL TIN ALKOXIDES AND THEIR HYDROLYSIS AND CONDENSATION PRODUCTS

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United States of America

APP PUB NO 20240427237A1
SERIAL NO

18823620

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Abstract

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Precursor solutions for radiation patternable coatings are formed with an organic solvent and monoalkyl tin trialkoxides in which the water content of the solvent is adjusted to be within 10 percent of a selected value. Generally, the water content of the solvent is adjusted through water addition, although water removal can also be used. In some embodiments, the adjusted water content of the solvent can be from about 250 ppm by weight to about 10,000 ppm by weight. With the appropriate selection of ligands, the adjusted precursor solutions can be stable for at least about 42 days, and in some cases at least 8 months.

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Patent Owner(s)

Patent OwnerAddress
INPRIA CORPORATION1100 NE CIRCLE BOULEVARD SUITE 360 CORVALLIS OR 97330

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Anderson, Jeremy T Corvallis, US 40 731
Cardineau, Brian J Corvallis, US 39 693
Clark, Benjamin L Corvallis, US 18 137
Jiang, Kai Corvallis, US 71 1337
McQuade, Lauren B Albany, US 5 30
Meyers, Stephen T Corvallis, US 47 1457
Smiddy, Dominick Corvallis, US 11 66
Wilson-Moses, Margaret Corvallis, US 4 15

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