SUBSTRATE PROCESSING SYSTEM AND DECOMPRESSION STRUCTURE

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United States of America

APP PUB NO 20250010322A1
SERIAL NO

18759451

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Abstract

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A substrate processing system capable of supplying a gas-dissolved liquid having a supersaturated amount of dissolved gas without generating large bubbles in a middle of a supply line is disclosed. The substrate processing system includes a control device configured to control an operation of a bubble generation device. The control device is configured to control at least one of a pressure regulator and a boost pump so that a pressure of a gas supplied to a gas-dissolved liquid generation device is smaller than a pressure of a liquid supplied to the gas-dissolved liquid generation device.

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Patent Owner(s)

Patent OwnerAddress
EBARA CORPORATIONTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ISHIBASHI, Tomoatsu Tokyo, JP 65 278

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