ALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250010331A1
SERIAL NO

18701169

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Abstract

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A method for making a dense organosilicon film with improved mechanical properties includes the steps of: providing a substrate within a reaction chamber; introducing into the reaction chamber a gaseous composition comprising alkoxy silane; and applying energy to the gaseous composition comprising alkoxysilane in the reaction chamber to induce reaction of the gaseous composition comprising alkoxysilane to deposit an organosilicon film on the substrate, wherein the organosilicon film has a dielectric constant of from ˜2.40 to ˜3.20, an elastic modulus of from ˜6 to ˜30 GPa, and an at. % carbon of from ˜10 to ˜45 as measured by XPS.

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Patent Owner(s)

Patent OwnerAddress
VERSUM MAT US LLCNot Provided

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
FOODY, MICHAEL JAMES PHOENIX, US 2 0
LEI, XINJIAN VISTA, US 203 13409
MACDONALD, MATTHEW R MISSION VIEJO, US 43 1358

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