ALL-IN-ONE WAFER CLEANING MACHINE FOR MONOCRYSTALLINE SILICON PRODUCTION

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250018440A1
SERIAL NO

18548574

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Abstract

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An all-in-one wafer cleaning machine for monocrystalline silicon production includes: a circulation track disposed at a rear end of a cleaning equipment main body and fixed to the cleaning equipment main body; a horizontal moving device disposed at an outer side of the circulation track; a first motor fixedly installed at one end inside the horizontal moving device; a first transmission gear disposed at an output end of the first motor; a first fixed rod fixedly disposed at the other end of the horizontal moving device; a first fixed gear disposed at one end of the first fixed rod, wherein the first transmission gear and the first fixed gear are engaged with the circulating track; and a vertical track fixedly disposed at the horizontal moving device.

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Patent Owner(s)

Patent OwnerAddress
TCL ZHONGHUAN RENEWABLE ENERGY TECHNOLOGY CO LTDNO 12 EAST HAITAI ROAD HUAYUAN INDUSTRIAL PARK (OUTER RING) TIANJIN NEW TECHNOLOGY INDUSTRIAL PARK BINHAI NEW AREA TIANJIN 300384

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CAO, Jingen Tianjin, CN 2 0
CHEN, Chunjuan Tianjin, CN 1 0
JIANG, Liwei Tianjin, CN 4 3
JIANG, Wei Tianjin, CN 488 4380
LU, Zhengping Tianjin, CN 1 0
MI, Xuejing Tianjin, CN 1 0
QU, Mengcheng Tianjin, CN 3 0
WU, Rui Tianjin, CN 58 144
WU, Zhijun Tianjin, CN 40 289
YAN, Liang Tianjin, CN 52 1082
ZHU, Dongxiao Tianjin, CN 1 0

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