VAPOR PHASE DEPOSITION OF ORGANIC FILMS
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United States of America Patent
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Issued Date -
Jan 23, 2025
app pub date -
Oct 4, 2024
filing date -
Oct 4, 2024
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Abstract
Methods and apparatus for vapor deposition of an organic film are configured to vaporize an organic reactant at a first temperature, transport the vapor to a reaction chamber housing a substrate, and maintain the substrate at a lower temperature than the vaporization temperature. Alternating contact of the substrate with the organic reactant and a second reactant in a sequential deposition sequence can result in bottom-up filling of voids and trenches with organic film in a manner otherwise difficult to achieve. Deposition reactors conducive to depositing organic films are provided.
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