METHOD FOR PREPARING ORGANIC-INORGANIC NANOCOMPOSITE PARTICLE DISPERSION LIQUID, ORGANIC-INORGANIC NANOCOMPOSITE PARTICLE DISPERSION LIQUID, AND CHEMICAL MECHANICAL POLISHING SOLUTION

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APP PUB NO 20250034430A1
SERIAL NO

18713122

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Abstract

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The present disclosure provides a method for preparing an organic-inorganic nanocomposite particle dispersion, comprising: preparing a negatively charged organic-inorganic nanocomposite particle dispersion: adding positively charged inorganic nanoparticles to an anionic organic polymer solution, stirring thoroughly, dispersing uniformly, and obtaining a negatively charged organic-inorganic nanocomposite particle dispersion; preparing a positively charged organic-inorganic nanocomposite particle dispersion: adding a negatively charged organic polymer inorganic metal oxide composite dispersion to a cationic organic polymer solution, stirring thoroughly, and dispersing uniformly to obtain a positively charged organic polymer inorganic nanocomposite particle dispersion; repeating step (1) and (2) alternately to obtain a dispersion of negatively charged and positively charged organic-inorganic nanocomposites by adjusting the number of step (1) and (2), respectively. Through the above methods, effective control of CMP polishing fluid performance can be achieved.

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Patent Owner(s)

Patent OwnerAddress
ANJI MICROELECTRONICS TECHNOLOGY (SHANGHAI) CO LTDT6-9 NO 5001 HUADONG ROAD JINQIAO EXPORT PROCESSING ZONE (SOUTH ZONE) PUDONG NEW AREA SHANGHAI 201201 201201

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHEN, Zhan Shanghai, CN 67 570
JIA, Changzheng Shanghai, CN 4 0
LI, Shoutian Shanghai, CN 22 185
LIU, Fengru Shanghai, CN 1 0
WANG, Xingping Shanghai, CN 12 6
Xu, Pengyu Shanghai, CN 10 50

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