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Abstract

Ultra-low noise nanopore chips with ultra-high signal are produced at the wafer scale by combining fused-silica chips that have ultra-low capacitance (which dominates signal noise at high bandwidth) with local ultra-thin regions. The method uses electron-beam lithography (EBL) and hydrofluoric acid (HF) etching is applied to the fused-silica chips in a manner designed to avoid labor intense thinning techniques and to ensure reproducible thickness of the membrane while maintaining the robust character of the resulting nanopore chips. The resulting nanopore chips are used to detect small organic analytes (˜1 nm), such as diethyl phthalate (DEP), that are desirable to measure for water monitoring applications such as in the water system aboard the International Space Station (ISS) and other spacecraft.

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First Claim