FLUID AERATOR TO REDUCE SPLASHING
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United States of America
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Issued Date -
Feb 6, 2025
app pub date -
Jul 23, 2024
filing date -
Jul 23, 2024
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Abstract
Embodiments herein provide a semiconductor substrate cleaning chamber. The cleaning chamber includes side walls that partially define a cleaning volume, a pedestal disposed within the side walls, and a cleaning arm disposed above the pedestal. The cleaning arm includes a nozzle assembly disposed on a nozzle end of the cleaning arm. The nozzle assembly includes a housing, and a body disposed within the housing and having a gas port disposed through the body and configured to aerate a fluid passing through the nozzle assembly.
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