COLLOIDAL SILICA AND PRODUCTION METHOD THEREFOR

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United States of America

APP PUB NO 20250042749A1
SERIAL NO

18722801

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A colloidal silica comprising water and silica particles, wherein the specific relaxation rate, as measured by pulsed NMR at a silica particle concentration of 3 mass %, is 0.60 or more, and the zeta potential of the surface of the silica particles in the pH range of 2 to 5 is −10 to 10 mV.

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Patent Owner(s)

  • FUSO CHEMICAL CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chiba, Toshiki Fukuchiyama-shi, Kyoto, JP 4 1
Kobayashi, Yuma Fukuchiyama-shi, Kyoto, JP 32 27
Nakano, Chiharu Fukuchiyama-shi, Kyoto, JP 6 4
Ozawa, Shuta Fukuchiyama-shi, Kyoto, JP 3 0
Tashima, Takahiro Fukuchiyama-shi, Kyoto, JP 4 20

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