NON-THERMAL, LIQUID PHASE DEPOSITION OF THIN FILMS WITH VACUUM ULTRAVIOLET LAMPS
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United States of America
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Feb 6, 2025
app pub date -
Dec 15, 2022
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Dec 15, 2022
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Abstract
A method for non-thermal oxide deposition deposit a liquid-phase oxide or other dielectric precursor onto a substrate. The precursor is distributed uniformly. Electromagnetic radiation having a sufficient large photon energy so as to decompose at least partially the precursor(s), e.g., VUV or far UV radiation, is directed at the uniformly distributed precursor to at least partially decompose the precursor and deposit an oxide or other dielectric film on the substrate. The VUV/deep-UV radiation has a photon energy which exceeds that of at least one of the chemical bonds of the precursor(s). Deposition can be conducted at low temperatures, e.g. below ˜65° C., providing the ability for deposition on a wide variety of substrates including polymers and other flexible substrates.
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