SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
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United States of America
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Issued Date -
Mar 6, 2025
app pub date -
Nov 20, 2024
filing date -
Nov 20, 2024
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Abstract
The present disclosure provides embodiments of a system and method for detecting processing chamber condition. The embodiments include performing a wafer-less processing step in a processing chamber to determine the condition of the chamber walls. Based on an analysis of the residual gas resulting from the wafer-less processing step, an operator or a process controller can determine whether the chamber walls have deteriorated to such an extent as to be cleaned.
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