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Abstract

In a substrate processing method and substrate processing, a preliminary organic solvent supply processing is performed between a chemical processing and a rinse processing. After the rinse processing, a replacement processing using an organic solvent and a liquid fill processing (liquid film formation processing) is performed to form a liquid film. The rinse liquid remains not on the inner bottom surface of the pattern, but at a position sandwiched by two types of liquid layers in a vertical direction. The rinse liquid comprising a remaining liquid diffuses with those liquid layers and becomes a so-called remaining liquid-free state. Under that state, a dry processing by the processing fluid in the supercritical state is performed.

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First Claim