SLURRY AND POLISHING METHOD
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United States of America
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Issued Date -
Mar 13, 2025
app pub date -
Nov 26, 2024
filing date -
Nov 26, 2024
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Abstract
A slurry containing abrasive grains and a liquid medium, in which the abrasive grains include first particles and second particles in contact with the first particles, the second particles contain at least one metal compound selected from the group consisting of a metal oxide and a metal hydroxide, the metal compound contains a metal capable of taking a plurality of valences, and a ratio of the lowest valence among the plurality of valences of the metal is 0.10 or more in X-ray photoelectron spectroscopy.
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