SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
Number of patents in Portfolio can not be more than 2000
United States of America
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Issued Date -
Mar 20, 2025
app pub date -
Sep 20, 2024
filing date -
Sep 20, 2024
priority date (Note) -
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status (Latency Note)
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Abstract
According to one embodiment, a substrate cleaning apparatus includes: a cleaning liquid supply unit for supplying a cleaning liquid to a rotating substrate, a first cleaning head for cleaning at least one surface of the rotating substrate by bringing a brush into contact with the one surface of the substrate, a second cleaning head for cleaning the one surface of the substrate by bringing a brush into contact with the one surface of the substrate, a turning arm for turning the first cleaning head and the second cleaning head, and a controller. The controller controls the turning arm such that, during cleaning in which a brush of one of the first cleaning head and the second cleaning head is brought into contact with a surface of the substrate to perform cleaning, the brush of the other is positioned at a position outside the substrate.
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