SUBSTRATE PROCESSING APPARATUS USING SUPERCRITICAL FLUID AND DRIVING METHOD THEREOF
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United States of America
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Mar 20, 2025
app pub date -
Apr 5, 2024
filing date -
Apr 5, 2024
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Abstract
A substrate processing apparatus includes a reactor having a processing space formed therein, a fluid supply unit supplying a supercritical fluid into the processing space of the reactor, and a controller controlling the reactor and the fluid supply unit. The controller controls, in response to whether a state of the supercritical fluid supplied to the reactor satisfies a set condition, the reactor and the fluid supply unit to perform one of cleaning of the processing space by using the supercritical fluid and drying of a substrate seated in the processing space by using the supercritical fluid.
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