SUBSTRATE PROCESSING DEVICE AND MAINTENANCE METHOD FOR SUBSTRATE PROCESSING DEVICE
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United States of America
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Issued Date -
Mar 20, 2025
app pub date -
Sep 19, 2024
filing date -
Sep 19, 2024
priority date (Note) -
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status (Latency Note)
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Abstract
A substrate processing device includes a processing chamber, three exhaust pipes, and an exhaust switching mechanism. The exhaust switching mechanism includes a switching box, three opening/closing mechanisms that individually open/close three communication ports for individually communicating the switching box and the three exhaust pipes, and three cleaning nozzles provided on an inner side of the switching box in correspondence with the three opening/closing mechanisms. Each of the three cleaning nozzles is provided to face the link mechanism of the corresponding opening/closing mechanism, and injects cleaning liquid to the link mechanism of the corresponding opening/closing mechanism.
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