NOZZLE POSITION ADJUSTING DEVICE, NOZZLE POSITION ADJUSTING METHOD, AND NOZZLE POSITION ADJUSTING HOLDER
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United States of America Patent
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Issued Date -
Mar 27, 2025
app pub date -
Sep 19, 2024
filing date -
Sep 19, 2024
priority date (Note) -
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status (Latency Note)
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Abstract
A nozzle position adjusting device is used for a substrate cleaning device including a substrate support portion that supports a substrate and a nozzle that jets a cleaning liquid toward the substrate. The nozzle position adjusting device includes a position confirmation plate in which a position display is formed and which is installed in the substrate support portion, and a positioning mechanism configured to extend from the nozzle toward the position confirmation plate. The positioning mechanism determines the position of the nozzle with respect to the position confirmation plate by using the position display.
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