APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
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United States of America Patent
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Issued Date -
Mar 27, 2025
app pub date -
Dec 10, 2024
filing date -
Dec 10, 2024
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Abstract
The inventive concept provides a substrate treating method. The substrate treating method includes first treating a substrate in a treating space according to a reference recipe; second treating a substrate in the treating space according to the reference recipe after the first treating; and optimizing an inner ambient of the treating space according to the reference recipe, and wherein the optimizing includes a purge operation of supplying and discharging a treating fluid to/from the treating space.
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