SUBSTRATE SURFACE TREATMENT DEVICE AND SUBSTRATE SURFACE TREATMENT METHOD
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United States of America Patent
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Issued Date -
Mar 27, 2025
app pub date -
Sep 11, 2024
filing date -
Sep 11, 2024
priority date (Note) -
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status (Latency Note)
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Abstract
Provided is a surface treatment device capable of performing surface treatment on a treatment surface of a substrate at low cost by reusing a mist of a treatment liquid introduced into a treatment chamber. The surface treatment device is a device for surface treatment of a substrate by causing a treatment liquid to adhere to the treatment surface of the substrate. The surface treatment device includes a mist generator that generates a mist of the treatment liquid; a treatment chamber that introduces the mist generated by the mist generator and causes the introduced mist to adhere to the treatment surface of the substrate; and a circulation path that circulates the mist discharged from the treatment chamber to the treatment chamber together with the mist generated by the mist generator.
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