HIGH-CHARACTERISTIC EPITAXIAL GROWTH SUBSTRATE AND METHOD FOR MANUFACTURING SAME

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20250101630A1
SERIAL NO

18724824

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

PURPOSE: To provide a method capable of detecting a large oxygen deposit existing in a silicon single crystal obtained by a CZ method with good sensitivity.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDJAPAN

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KAWAI, Makoto Gunma, JP 151 2348
KUBOTA, Yoshihiro Gunma, JP 175 1781

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation