EUV MASK AND PELLICLE ASSEMBLY

United States of America Patent

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Issued Date
Mar 27, 2025
app pub date
Sep 27, 2023
filing date
Sep 27, 2023

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Abstract

Provided is a pellicle assembly that is sufficiently conductive in cooperation with a photomask that is mounted to the pellicle assembly to protect the pellicle and mask from electro static discharge.

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Patent Owner(s)

Patent Owner	Address
INTEL CORPORATION	2200 MISSION COLLEGE BOULEVARD SANTA CLARA CA 95054

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G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
KIM, Yongbae	San Jose, US	7	20

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EUV MASK AND PELLICLE ASSEMBLY

Number of patents in Portfolio can not be more than 2000

United States of America Patent

18373485

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