LIQUID PROCESSING METHOD, DISCHARGE ADJUSTMENT METHOD, AND LIQUID PROCESSING APPARATUS

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250108393A1
SERIAL NO

18836386

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A processing liquid is sent to a discharge nozzle through a processing liquid valve to discharge the processing liquid from the discharge nozzle toward a substrate. The processing liquid valve controls a flow of the processing liquid in a flow channel that is connected to the discharge nozzle, depending on a pressure of a working fluid that is supplied thereto. A fluid pressure adjustment unit adjusts behavior of a variation of a pressure of the working fluid that is supplied to the processing liquid valve, depending on an adjustment parameter that is set variably. The processing liquid that is sent to the discharge nozzle through the processing liquid valve is limited to stop discharge of the processing liquid from the discharge nozzle. Correlation data are acquired between a working fluid parameter that indicates behavior of a variation of a pressure of the working fluid and the adjustment parameter.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO 107-6325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
FUKUSHIMA, Kenji Kumamoto, JP 26 177
MARUMOTO, Hiroshi Kumamoto, JP 33 58

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