THIN-FILM FORMING RAW MATERIAL USED IN ATOMIC LAYER DEPOSITION METHOD AND METHOD OF PRODUCING THIN-FILM

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United States of America

APP PUB NO 20250109296A1
SERIAL NO

18978671

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Abstract

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Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following formula (1):

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Patent Owner(s)

Patent OwnerAddress
ADEKA CORPORATIONTOKYO 116-8554

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ENZU, Masaki Tokyo, JP 20 19
TAKEDA, Keisuke Tokyo, JP 38 195

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